Bead Mill for CMP Slurry Dispersion: In CMP slurry, a single oversized particle can scratch a wafer worth thousands of dollars. Here's how dispersion controls that risk. CMP (chemical mechanical planarization) slurry uses nanoscale abrasive particles — typically colloidal silica or ceria — suspended in a chemical solution to polish semiconductor wafers to atomic-level flatness. Unlike most dispersion applications, a small number of oversized particles in CMP slurry can cause